It's not a normal cabinet

With semiconductor submicron dimension, gas purity is paramount. Our Gas Source Manifold represents the next generation of ultra pure gas source manifolds designed specifically for use in submicron fabrication environments.

Utilizing spring-less diaphragm valves, pressure transducers, and tied diaphragm regulators,
the manifold is engineered to deliver complete control of the source supply of specialty gases. An in-line architecture and a compact modular design reduce the dead space volume compared to other high-purity manifold configurations. The result is a manifold with excellent purge efficiency providing maximum protection for personnel and process.

Our Gas Source Manifold design is ideal for supplying specialty gases to process tools that manufacture semiconductor devices with geometries of less than 0.2µm. The system is available in a variety of process-specific configurations:

•   Auto-Purge Manifolds designed for flammable, toxic, pyrophoric or corrosive HPM gases
•   Safety protected manual manifolds with ESO capabilities for HPM applications
•   Manual and Auto-Purge Manifolds for inert process gases

Standard Features  Valves- Springless diaphragm  Tied disphragm regulators  Pressure transducers  Hasterlloy mesh pre-filter  Excess flow switch  Purge and vent transducer  Manifold purity validation

Options  Manifold purity ceritification  High pressure leak test  Vacuum access port  Damage control configurations  Dual isolation valves  NANOCHEM® purification  All-Metal final filter

Specifications  Inboard leak rate: <1 x 10-9 sccs  Outboard leakage: <2ppm He above background  Particulates per ft3  0.1 - 0.3µm: <5 Counts  > 0.3µm: 0 Counts  EP Surface Finish: 5 - 7µ in Ra Average  Moisture: <10ppb  Oxygen: <100ppb  Total Hydrocarbons: <100ppb