Matheson's SDSTM offers completely new approach to the storage and delivery of dopant gases for ion implantation. In the SDSTM, the pure dopant gases are absorbed on specially activated solid media at pressures below one atmosphere. The SDSTM provides a simple, cost-effective system with:

•   Greater Safety
•   Increased Uptime
•   Consistent Quality

SDS™ is available in:

Arsine,

Phosphine,

Boron Trifluoride,

Germanium Tetrafluoride,

Silicon Tetrafluoride,

Phosphorus Triflouride,

Hydrogen Selenide and

Arsenic Pentaflouride.